Institute for X-Ray Physics - Institut für Röntgenphysik

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G.Schmahl, P.Guttmann, D.Raasch, P.Fischer, G. Schütz
Imaging of Magnetic Domains at BESSY
Synchrotron Radiation News, Vol. 9, No. 6 (1996) 35-� 39
P.Fischer, G.Schütz, G.Schmahl, P.Guttmann, D.Raasch
Imaging of magnetic domains with the X-ray microscope at BESSY using X-ray magnetic circular dichroism
Z. Phys B 101 (1996) 313-316
J. Thieme, J. Niemeyer
Fractal characterization of hematite aggregates by x-ray microscopy
Geologische Rundschau 85 (1996) 852-856
G. Schmahl, D Rudolph, G. Schneider, J. Thieme, T. Schliebe, B. Kaulich, M. Hettwer
Diffraction Optics for X-Ray Imaging
In: Nanotechnology - Special Issue of Microelectronics Engineering, eds. P. Vettiger, D. Kern, U. Staufer, Microelectronic Engineering 32 (1996) 351-367
T.Schliebe, G.Schneider, H Aschoff
Nanostructuring high resolution phase zone plates in nickel and germanium using cross-linked polymers
Microcircuit Engineering (1996)
H.Kihara, A.Yamamoto, P.Guttmann, and G.Schmahl
Observation of the internal membrane system of COS cells by x-ray microscopy
Journal of Electron Spectroscopy and related Phenomena 80 (1996) 369-372
M.F.Trendelenburg, O.V.Zatsepina, T.Waschek, W.Schlegel, H.Tröster, D,Rudolph, G.Schmahl, H.Spring
Multiparameter microscopic analysis of nuclear structure and ribosomal gene transcription
Histochem Cell Biol 106 (1996) 167 - 192
T.Preis and J.Thieme
Dynamical Studies of Aqueous Clay Mineral Dispersions by X-ray Microscopy
Langmuir, Vol.12, Nr.4 (1996) 1105 - 1106
A.Irtel v.Brenndorff, B.Niemann, D.Rudolph, and G.Schmahl
A Monochromator for Scanning X-Ray Microscopy Beamlines at 3rd Generation Synchrotron Light Sources
J. Synchrotron Rad. 3 (1996) 197-198
B.Niemann, T.Wilhein, T.Schliebe, R.Plontke, O.Fortagne, I.Stolberg, M.Zierbock
A special method to create gratings of variable line density by low voltage electron beam lithography
Microelectronic Engineering 30 (1996) 49-52
G.Schmahl, D.Rudolph, B.Niemann, P J.Thieme, G.Schneider
Naturwissenschaften 83 (1996) 61 - 70
T. Salditt, D. Lott, T.H. Metzger, J. Peisl, G. Vignaud, J.F. Legrand, G. Grübel, P. Hoghoj, O. Schärpf
Characterization of interface roughness in W/Si multilayers by high resolution diffuse x-ray scattering
Physica B 221 13, (1996)
T. Salditt, D. Lott, T.H. Metzger, J. Peisl, R. Fischer, J. Zweck, P. Hoghoj, O. Schärpf, G. Vignaud
Observation of the Huygens-principle growth mechanism in sputtered W/Si multilayers
Europhys.Lett. 36, 565 (1996)
T. Salditt, D. Lott, T.H. Metzger, J. Peisl, G. Vignaud, P. Hoghoj, O. Schärpf, P. Hinze, R. Lauer
Interfacial roughness and related growth mechanisms in sputtered W/Si multilayers
Phys.Rev.B 54, 5860 (1996)